Regular papers

Three-grating monolithic phase-mask for the single-order writing of large-period gratings

¹ Université de Lyon, Laboratoire Hubert Curien, UMR CNRS 5516, 18 rue du Pr. B. Lauras, 42000 Saint-Etienne, France
² University of Eastern Finland, Department of Physics and Mathematics, P.O Box 111, 80101 Joensuu, Finland
³ Tampere University of Technology, P.O. Box 527, 33101 Tampere, Finland

^* yannick.bourgin@univ-st-etienne.fr

Received: 30 April 2010

Abstract

An optimized achromatic high-efficiency monolithic phase mask is presented whose principle was demonstrated and described in reference [1]. The mask comprises three submicron period diffraction gratings at a single substrate side that create a purely single spatial frequency interferogram of large period. The optical scheme is that of an integrated Mach-Zehnder interferometer where all light circulation functions are performed by diffraction gratings. The paper describes the operation principle of the phase mask, the fabrication process, and its utilization in a write-on-the-fly scheme for the writing of a long, 2 μm-period grating.