Issue |
J. Eur. Opt. Soc.-Rapid Publ.
Volume 5, 2010
|
|
---|---|---|
Article Number | 10006 | |
Number of page(s) | 6 | |
DOI | https://doi.org/10.2971/jeos.2010.10006 | |
Published online | 21 January 2010 |
Regular papers
Nanostructured surface fabricated by laser interference lithography to attenuate the reflectivity of microlens arrays
1
Optics and Photonics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Fédérale de Lausanne (EPFL), A.-L. Breguet 2, 2000 Neuchâtel, Switzerland
2
Department of Physics and Mathematics, University of Joensuu, Joensuu, 80100, Finland
3
Electrical and Computer Engineering Dept., Montana State University, Bozeman, MT 59717-3780, USA
a pierre-yves.baroni@epfl.ch
b birgit.paivanranta@joensuu.fi
c toralf.scharf@epfl.ch
d wataru.nakagawa@ece.montana.edu
e matthieu.roussey@epfl.ch
f markuu.kuittinen@joensuu.fi
g hanspeter.herzig@epfl.ch
Received:
10
October
2009
A subwavelength-scale square lattice optical nanostructure is fabricated using an interference photolithography process on the surface of a quartz microlens array. This nanostructuring of the quartz surface introduces an antireflective effect, reducing reflectivity between 10% and 30% and enhancing the transmissivity 3% in the visible spectrum. This approach permits fast fabrication on a 4-inch wafer covered with microlenses (non-flat surface) and produces monolithic devices which are robust to adverse environments such as temperature variations.
Key words: antireflective / nanostructure / microlens / interference photolithography
© The Author(s) 2010. All rights reserved.
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