| Issue |
J. Eur. Opt. Soc.-Rapid Publ.
Volume 6, 2011
|
|
|---|---|---|
| Article Number | 11015s | |
| Number of page(s) | 5 | |
| DOI | https://doi.org/10.2971/jeos.2011.11015s | |
| Published online | 18 April 2011 | |
Regular papers
Comparison of far field characterisation of DOEs with a goniometric DUV-scatterometer and a CCD-based system
1
Physikalisch-Technische Bundesanstalt, Bundesallee 100, 38116 Braunschweig, Germany
2
Carl Zeiss SMT AG, Rudolf-Eber-Strasse 2, 73447 Oberkochen, Germany
Received:
3
May
2010
We have measured far field diffraction patterns of different diffractive optical elements at an illumination wavelength of 193 nm using a new type of goniometric DUV (deep ultraviolet) scatterometer. This system offers both a high dynamic range and angular resolution. The scatterometer is especially suitable to analyse weak background light like stray light and local variations of the diffraction patterns over the DOEs (diffractive optical element). The measurement results are compared with measurements using a CCD (charge-coupled device)-based imaging DOE measurement system. An excellent agreement of the measured far field distributions is demonstrated.
Key words: DOE / optical diffuser / scatterometry / 193 nm / scattering
© The Author(s) 2011. All rights reserved.
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.