Open Access
Table 1
Deposition parameters and fitted structural properties of periodic multilayers for XRR. Uncertainties on fitted values are obtained from the sensitivity analysis of XRR fits at multiple energies.
| Sample ID | W-DC-31 | W-DC-25 | WRe-DC-46 | WRe-HP-26 |
|---|---|---|---|---|
| Multilayer structure | ||||
| Absorber material | W | W | WRe | WRe |
| Absorber deposition mode | dcMS | dcMS | dcMS | HiPIMS |
| Spacer material | SiC | SiC | SiC | SiC |
| Spacer deposition mode | rfMS | rfMS | rfMS | rfMS |
| Deposition parameters | ||||
| Absorber: avg. power (W) | 40 | 40 | 40 | 60 |
| Absorber: avg. voltage (V) | 262 | 262 | 322 | 710 |
| Absorber: peak current (A) | – | – | – | 14 |
| Absorber: pulse frequency (Hz) | – | – | – | 1000 |
| Absorber: pulse duration (μs) | – | – | – | 30 |
| Spacer: rf power (W) | 200 | 200 | 200 | 200 |
| Fitted structural parameters | ||||
| Period d (nm) | 3.65 ± 0.01 | 3.28 ± 0.01 | 3.50 ± 0.01 | 3.34 ± 0.01 |
| Stacking ratio Γ | 0.47 ± 0.05 | 0.45 ± 0.05 | 0.41 ± 0.05 | 0.43 ± 0.05 |
| ρ SiC (g cm−3) | 4.1 ± 0.5 | 4.5 ± 0.5 | 3.4 ± 0.5 | 3.3 ± 0.5 |
| ρabs (g cm−3) | 15.1 ± 0.5 | 15.3 ± 0.5 | 16.7 ± 0.5 | 17.1 ± 0.5 |
| σabs/SiC (nm)** | 0.19 ± 0.05 | 0.33 ± 0.05 | 0.30 ± 0.05 | 0.35 ± 0.05 |
| σSiC/abs (nm) | 0.22 ± 0.05 | 0.38 ± 0.05 | 0.23 ± 0.05 | 0.26 ± 0.05 |
**
Roughness for absorber on SiC interface.
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