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Table 1

Deposition parameters and fitted structural properties of periodic multilayers for XRR. Uncertainties on fitted values are obtained from the sensitivity analysis of XRR fits at multiple energies.

Sample ID W-DC-31 W-DC-25 WRe-DC-46 WRe-HP-26
Multilayer structure
 Absorber material W W WRe WRe
 Absorber deposition mode dcMS dcMS dcMS HiPIMS
 Spacer material SiC SiC SiC SiC
 Spacer deposition mode rfMS rfMS rfMS rfMS
Deposition parameters
 Absorber: avg. power (W) 40 40 40 60
 Absorber: avg. voltage (V) 262 262 322 710
 Absorber: peak current (A) 14
 Absorber: pulse frequency (Hz) 1000
 Absorber: pulse duration (μs) 30
 Spacer: rf power (W) 200 200 200 200
Fitted structural parameters
 Period d (nm) 3.65 ± 0.01 3.28 ± 0.01 3.50 ± 0.01 3.34 ± 0.01
 Stacking ratio Γ 0.47 ± 0.05 0.45 ± 0.05 0.41 ± 0.05 0.43 ± 0.05
ρ SiC (g cm−3) 4.1 ± 0.5 4.5 ± 0.5 3.4 ± 0.5 3.3 ± 0.5
ρabs (g cm−3) 15.1 ± 0.5 15.3 ± 0.5 16.7 ± 0.5 17.1 ± 0.5
σabs/SiC (nm)** 0.19 ± 0.05 0.33 ± 0.05 0.30 ± 0.05 0.35 ± 0.05
σSiC/abs (nm) 0.22 ± 0.05 0.38 ± 0.05 0.23 ± 0.05 0.26 ± 0.05
**

Roughness for absorber on SiC interface.

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