EDP Sciences logo
Submit your research paper
Search
Menu
All issues Volume 22 / No 2 (2026) J. Eur. Opt. Society-Rapid Publ., 22 2 (2026) 57 References
Open Access
Issue
J. Eur. Opt. Society-Rapid Publ.
Volume 22, Number 2, 2026
Article Number 57
Number of page(s) 10
DOI https://doi.org/10.1051/jeos/2026048
Published online 14 July 2026
  1. Windt DL. Advancements in Hard X-Ray Multilayers for x-Ray Astronomy. SPIE Optical Engineering + Applications, edited by O’Dell SL et al. (San Diego, California, United States, 2015), 96031C. https://doi.org/10.1117/12.2187481. [Google Scholar]
  2. Tallents G et al., Lithography at EUV wavelengths. Nat. Photonics 4(12), 809–811 (2010). https://doi.org/10.1038/nphoton.2010.277. [Google Scholar]
  3. Kazazis D et al., Extreme ultraviolet lithography. Nat. Rev. Methods Primers 4(1), 84 (2024https://doi.org/10.1038/s43586-024-00361-z. [Google Scholar]
  4. Singhapong W et al., Multilayer optics for synchrotron applications. Adv. Mater. Technol. 9(18), 2302187 (2024). https://doi.org/https://doi.org/10.1002/admt.202302187. [Google Scholar]
  5. Windt DL. Monochromatic mammography using scanning multilayer X-ray mirrors. en (). [Google Scholar]
  6. Ravinet N et al., Design and simulation of multilayer coatings for a multi-channel Wolter-like x-ray imager with large field of view and high resolution. Rev. Sci. Instrum. 94(10), 103502 (2023). https://doi.org/10.1063/5.0165414. [Google Scholar]
  7. Ravinet N et al., Multilayer coatings for a multi channel Wolter-like x-ray imager with large field of view and high resolution: Experimental development and study of the instrument performance. Rev. Sci. Instrum. 97(4), 041304 (2026). https://doi.org/10.1063/5.0316988. [Google Scholar]
  8. Windt DL et al., W/SiC x-ray multilayers optimized for use above 100 keV. Appl. Opt. 42(13), 2415–2421 (2003). https://doi.org/10.1364/AO.42.002415. [Google Scholar]
  9. Pradhan PC et al., Fabrication and Performance of a High Resolution Ultra-Short Period W/B4 C Multilayer Structure. J. Phys. D. Appl. Phys. 49(13), 135305 (2016). https://doi.org/10.1088/0022-3727/49/13/135305. [Google Scholar]
  10. Chon K et al., Monochromatic X-ray imaging system using a W/C multilayer mirror. J. Korean Phys. Soc. 55(6), 2571–2577 (2009). https://doi.org/10.3938/jkps.55.2571. [Google Scholar]
  11. Nannini C et al., Selecting Materials for Short-Period Multilayer X-ray mirrors: Comparison between peak and integrated reflectivity. Advances in Optical Thin Films VIII, edited by Lequime M et al. Strasbourg, France: (SPIE, 2024), 67. https://doi.org/10.1117/12.3016698. [Google Scholar]
  12. Kouznetsov V et al., A novel pulsed magnetron sputter technique utilizing very high target power densities. Surf. Coat. Technol. 122(2), 290–293 (1999). https://doi.org/10.1016/S0257-8972(99)00292-3. [Google Scholar]
  13. Hörnström SE et al., Tungsten–rhenium alloys as diffusion barriers between aluminum and silicon. J. Vac. Sci. Technol. A 6(3), 1650–1655 (1988). https://doi.org/10.1116/1.575302. [Google Scholar]
  14. Tian B et al., Effect of magnetron sputtering parameters on adhesion properties of tungsten–rhenium thin film thermocouples. Ceram. Int. 44, S15–S18 (2018). https://doi.org/10.1016/j.ceramint.2018.08.334. [Google Scholar]
  15. Shapagina NA et al., Coatings based on refractory materials for corrosion and wear applications. Materials 17(23), 5936 (2024). https://doi.org/10.3390/ma17235936. [Google Scholar]
  16. Lee P et al., Soft X-ray optics using multilayer mirrors. Opt. Eng. 24(1), 241197 (1985). https://doi.org/10.1117/12.7973449. [Google Scholar]
  17. Chauvineau JP et al., The fabrication of multilayers for soft X-rays and extreme ultra-violet mirrors. J. Opt. 15(4B), 265–269 (1984). https://doi.org/10.1088/0150-536X/15/4B/306. [Google Scholar]
  18. Bruijn M et al., Optimization of multilayer soft Xray mirrors. Nucl. Instrum. Methods Phys. Res. 219(3), 603–606 (1984). https://doi.org/10.1016/0167-5087(84)90238-2. [Google Scholar]
  19. Ziegler E et al., Stability of multilayers for synchrotron optics. Appl. Phys. Lett. 48(20), 1354–1356 (1986). https://doi.org/10.1063/1.96907. [Google Scholar]
  20. Rumble JR, ed. CRC Handbook of Chemistry and Physics, 102 edn 2021–2022. (Boca Raton London New York: CRC Press, 2021. [Google Scholar]
  21. Lundin D et al., An introduction to thin film processing using high-power impulse magnetron sputtering. J. Mater. Res. 27(5), 780–792 (2012). https://doi.org/10.1557/jmr.2012.8. [Google Scholar]
  22. Anders A. High power impulse magnetron sputtering: A possible route to coatings for superconducting RF cavities (2010). [Google Scholar]
  23. Nannini C et al., HiPIMS deposition method unlocks higher X-ray reflectance in ultra-short-period multilayer mirrors. Opt. Lett. 50(21), 6513–6516 (2025). https://doi.org/10.1364/OL.571400. [Google Scholar]
  24. Samuelsson M et al., On the film density using high power impulse magnetron sputtering. Surf. Coat. Technol. 205(2), 591–596 (2010). https://doi.org/10.1016/j.surfcoat.2010.07.041. [Google Scholar]
  25. Attwood D et al., X-Rays and Extreme Ultraviolet Radiation: Principles and Applications, 2nd edn. (Cambridge: Cambridge University Press, 2017). https://doi.org/10.1017/CBO9781107477629. [Google Scholar]
  26. Walton C et al., X-ray optical multilayers: microstructure limits on reflectivity at ultra-short periods. Acta Mater. 46(11), 3767–3775 (1998). https://doi.org/10.1016/S1359-6454(98)00083-4. [Google Scholar]
  27. Parratt LG. Surface studies of solids by total reflection of X-rays. Phys. Rev. 95(2), 359–369 (1954). https://doi.org/10.1103/PhysRev.95.359. [CrossRef] [Google Scholar]
  28. Henke BL et al., X-ray interactions: photoabsorption, scattering, transmission, and reflection at E = 50-30,000 eV, Z = 1-92. At. Data Nucl. Data Tables 54(2), 181–342 (1993). https://doi.org/10.1006/adnd.1993.1013. [Google Scholar]
  29. Chantler C et al., X-Ray form factor, attenuation and scattering tables (Version 2.0). (2003). [Google Scholar]
  30. Névot L et al., Caractérisation des surfaces parréflexion rasante de rayons X. Application à l’étudedu polissage de quelques verres silicates. Revue de Physique Appliquée 15(3), 761–779 (1980). https://doi.org/10.1051/rphysap:01980001503076100. [Google Scholar]
  31. Görner W et al., BAMline: The first hard X-ray beamline at BESSY II. Nucl. Instrum. Methods Phys. Res. Sect A: Accel., Spectrometers, Detectors Associated Equip. 467–468(10), 703–706 (2001). https://doi.org/10.1016/S0168-9002(01)00466-1. [Google Scholar]
  32. Ziegler E. The ESRF BM05 Metrology Beamline: Instrumentation And Performance Upgrade. AIP Conference Proceedings. Vol. 705. (San Francisco, California (USA): AIP, 2004), pp. 436–439. https://doi.org/10.1063/1.1757827. [Google Scholar]
  33. Delmotte F et al., At wavelength metrology of high-reflectance multilayer mirror in the water window. J. Appl. Phys. 139(1), 013107 (2026). https://doi.org/10.1063/5.0310891. [Google Scholar]
  34. IJpes D et al., High reflectance ultrashort period W/B4C x-ray multilayers via intermittent ion polishing. J. Appl. Phys. 136(24), 245302 (2024). https://doi.org/10.1063/5.0230745. [Google Scholar]
  35. Kim CK et al., Study and characterization of W/Si and W/B4C multilayer for applications in hard X-rays mirror. Korean J. Chem. Eng. 32(10), 2124–2132 (2015). https://doi.org/10.1007/s11814-015-0068-0. [Google Scholar]
  36. Mollick F et al., Structure, stress, and optical property correlations in nano-structured Mo/Si and W/B4C multilayer mirrors for hard x-ray applications. J. Appl. Phys. 138(17), 175303 (2025). https://doi.org/10.1063/5.0291236. [Google Scholar]
  37. Vainer YA et al., Analysis of cross-correlation of interface roughness in multilayer structures with ultrashort periods. J. Exp. Theor. Phys. 103(3), 346–353 (2006). https://doi.org/10.1134/S1063776106090020. [Google Scholar]
  38. Mineral commodity summaries 2024. Tech. Rep. (2024). https://doi.org/10.3133/mcs2024. [Google Scholar]

Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.

Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.

Initial download of the metrics may take a while.