Atomic layer deposition for hafnium oxide-based meta-optics in the ultraviolet spectral range | Journal of the European Optical Society-Rapid Publications

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Table 2

Compared HfO2 thins films prepared by PEALD with different ALD tools.

	HfO₂ – Type A	HfO₂ – Type B
reference	this work; [29]	[33]
PEALD tool	OpAL	SILAYO-ICP330
precursors	TDMAH + O₂ plasma	TDMAH + O₂ plasma
substrate temperature	100 °C	100 °C
density	7.90 gcm-3	8.25 gcm-3
surface roughness	0.8 nm (XRR)	1.07 nm (AFM)

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