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All issues Volume 22 / No 1 (2026) J. Eur. Opt. Society-Rapid Publ., 22 1 (2026) 33 References
EOSAM 2025
Open Access
Issue
J. Eur. Opt. Society-Rapid Publ.
Volume 22, Number 1, 2026
EOSAM 2025
Article Number 33
Number of page(s) 5
DOI https://doi.org/10.1051/jeos/2026036
Published online 07 May 2026
  1. Yin YT, Huang CC, Chiu PH, Jiang Y Sen, Hoo JY, Chen MJ, High-quality HfO2 high-K gate dielectrics deposited on highly oriented pyrolytic graphite via enhanced precursor atomic layer seeding, ACS Appl. Electron. Mater. 7, 1943–1952 (2025). https://doi.org/10.1021/ACSAELM.4C02224. [Google Scholar]
  2. Zhang S, Zhang T, Yu H, Li T, Li X, Cui C, et al., Wafer-scale high-κ HfO2 dielectric films with sub-5-Å equivalent oxide thickness for 2D MoS2 transistors, Nat. Commun. 17, 1888 (2026). https://doi.org/10.1038/s41467-026-68584-0. [Google Scholar]
  3. Choi JH, Mao Y, Chang JP, Development of hafnium based high-k materials – A review, Mater. Sci. Eng. R. Rep. 72, 97–136 (2011). https://doi.org/10.1016/J.MSER.2010.12.001. [Google Scholar]
  4. Chow R, Falabella S, Loomis GE, Rainer F, Stolz CJ, Kozlowski MR, Reactive evaporation of low-defect density hafnia, Appl. Opt. 32, 5567 (1993). https://doi.org/10.1364/AO.32.005567. [Google Scholar]
  5. Lehan JP, Mao Y, Bovard BG, Macleod HA, Optical and microstructural properties of hafnium dioxide thin films, Thin Solid Films 203, 227–250 (1991). https://doi.org/10.1016/0040-6090(91)90131-G. [Google Scholar]
  6. Balog M, Schieber M, Michman M, Patai S, Chemical vapor deposition and characterization of HfO2 films from organo-hafnium compounds, Thin Solid Films 41, 247–259 (1977). https://doi.org/10.1016/0040-6090(77)90312-1. [Google Scholar]
  7. Ritala M, Leskelä M, Niinistö L, Prohaska T, Friedbacher G, Grasserbauer M, Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxy, Thin Solid Films 250, 72–80 (1994). https://doi.org/10.1016/0040-6090(94)90168-6. [Google Scholar]
  8. Stock C, Siefke T, Zeitner U, Metasurface-based patterned wave plates for VIS applications, J Opt Soc Am B 36, D97 (2019). https://doi.org/10.1364/JOSAB.36.000D97. [Google Scholar]
  9. Siefke T, Kley E-B, Tünnermann A, Kroker S, Design and fabrication of titanium dioxide wire grid polarizer for the far ultraviolet spectral range, in: Proceedings of SPIE – The International Society for Optical Engineering, vol. 9927, edited by Campo EM, Dobisz EA, Eldada LA (2016). https://doi.org/10.1117/12.2237644. [Google Scholar]
  10. Ossiander M, Meretska ML, Hampel HK, Lim SWD, Knefz N, Jauk T, et al., Extreme ultraviolet metalens by vacuum guiding, Science 1979, 380, 59–63 (2023). https://doi.org/10.1126/SCIENCE.ADG6881. [Google Scholar]
  11. Kaufmann J, Siefke T, Ronning C, Zeitner UD, Fabrication of EUV gratings via ion irradiation JW4A.15 (2024). [Google Scholar]
  12. Sorokina A, Meyer AA, Grimpe CF, Du G, Sauer S, Jordan JE, Mehlstäubler TE, Kroker S, Numerical analysis of a high-efficiency dual-material waveguide-grating coupler system for ultraviolet photonics, Opt. Continuum. 4, 10 (2025). https://doi.org/10.1364/OPTCON.568352. [Google Scholar]
  13. Alombert-Goget G, Trichard F, Li H, Pezzani C, Silvestre M, Barthalay N, et al., Titanium distribution profiles obtained by luminescence and LIBS measurements on Ti: Al2O3 grown by Czochralski and Kyropoulos techniques, Opt. Mater. (Amst) 65, 28–32 (2017). https://doi.org/10.1016/J.OPTMAT.2016.09.049. [Google Scholar]
  14. Trichard F, Moncayo S, Devismes D, Pelascini F, Maurelli J, Feugier A, et al., Evaluation of a compact VUV spectrometer for elemental imaging by laser-induced breakdown spectroscopy: application to mine core characterization, J. Anal. At. Spectrom. 32, 1527–134 (2017). https://doi.org/10.1039/C7JA00185A. [Google Scholar]
  15. Bassel L, Motto-Ros V, Trichard F, Pelascini F, Ammari F, Chapoulie R, et al., Laser-induced breakdown spectroscopy for elemental characterization of calcitic alterations on cave walls, Environ. Sci. Pollut. Res. 24, 2197–2204 (2017). https://doi.org/10.1007/S11356-016-7468-5/FIGURES/5. [Google Scholar]
  16. Alvisi M, Di Giulio M, Marrone SG, Perrone MR, Protopapa ML, Valentini A, et al., HfO2 films with high laser damage threshold, Thin Solid Films 358, 250–258 (2000). https://doi.org/10.1016/S0040-6090(99)00690-2. [Google Scholar]
  17. Stolz CJ, Thomas MD, Griffin AJ, BDS thin film damage competition, 7132, 107–113 (2008). https://doi.org/10.1117/12.806287. [Google Scholar]
  18. Fan Y, Liu J, Jiang J, Jiang LM, Ion radiation effects on the stability of hafnium oxide-based ferroelectric thin films: mechanisms and regulation, IEEE Trans. Device Mater. Rel. 25, 314–322 (2025). https://doi.org/10.1109/TDMR.2025.3550950. [Google Scholar]
  19. Ding M, Liu X, Damage effect of hafnium oxide gate dielectric based metal-oxide-semiconductor structure under gamma-ray irradiation, AIP Adv. 11, 65304 (2021). https://doi.org/10.1063/5.0048080/993914. [Google Scholar]
  20. Kant S, Kumari N, Kumar M, Effect of deposition conditions on the morphological, optical, and corrosion behavior of electron beam evaporated high-performance HfO2 thin films, Appl. Phys. A Mater. Sci. Process. 131, 631 (2025). https://doi.org/10.1007/s00339-025-08755-w. [Google Scholar]
  21. Ramzan M, Rana AM, Ahmed E, Bhatti AS, Hafeez M, Ali A, et al., Optical description of HfO2/Al/HfO2 multilayer thin film devices, Curr. Appl. Phys. 14, 1854–1860 (2014). https://doi.org/10.1016/J.CAP.2014.10.023. [Google Scholar]
  22. Araiza J de J, Álvarez-Fraga L, Gago R, Sánchez O, Surface morphology and optical properties of hafnium oxide thin films produced by magnetron sputtering, Materials 16, 5331 (2023) https://doi.org/10.3390/MA16155331. [Google Scholar]
  23. Thielsch R, Gatto A, Kaiser N, Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region, Appl. Opt. 41, 16 (2002) https://doi.org/10.1364/AO.41.003211. [Google Scholar]
  24. Bundesmann C, Neumann H, Tutorial: The systematics of ion beam sputtering for deposition of thin films with tailored properties, J. Appl. Phys. 124, 231102 (2018). https://doi.org/10.1063/1.5054046. [Google Scholar]
  25. Jiang K, Anderson JT, Hoshino K, Li D, Wager JF, Keszler DA, Low-energy path to dense HfO2 thin films with aqueous precursor, Chem. Mater. 23 (4), 945–952 (2011). https://doi.org/10.1021/cm102082j. [Google Scholar]
  26. Nishide T, Honda S, Matsuura M, Ide M, Surface, structural and optical properties of sol-gel derived HfO2 films, Thin Solid Films 371, 61 (2000) https://doi.org/10.1016/S0040-6090(00)01010-5. [Google Scholar]
  27. Zaharescu M, Teodorescu VS, Gartner M, Blanchin, MG, Barau A, Anastasescu M, Correlation between the method of preparation and the properties of the sol–gel HfO2 thin films, J. Non-Cryst. Solids 354, 409 (2008) https://doi.org/10.1016/j.jnoncrysol.2007.07.097. [Google Scholar]
  28. Kull M, Piirsoo HM, Tarre A, Mändar H, Tamm A, Jõgiaas T, Hardness, modulus, and refractive index of plasma-assisted atomic-layer-deposited hafnium oxide thin films doped with aluminum oxide, Nanomaterials 13, 1607 (2023). https://doi.org/10.3390/NANO13101607/S1. [Google Scholar]
  29. Shestaeva S, Bingel A, Munzert P, Ghazaryan L, Patzig P, Tünnermann A, Szeghalmi A, Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications, Appl. Opt. 56, 4 (2017) https://doi.org/10.1364/AO.56.000C47. [Google Scholar]
  30. Kim K-M, Jang JS, Yoon S-G, Yun J-Y, Chung N-K, Structural, optical and electrical properties of HfO2 thin films deposited at low-temperature using plasma-enhanced atomic layer deposition, Materials 13(9), 2008 (2020). https://doi.org/10.3390/ma13092008. [Google Scholar]
  31. Lapteva M, Beladiya V, Riese S, Hanke P, Otto F, Fritz T, Schmitt P, Olaf Stenzel O, Andreas Tünnermann A, Szeghalmi A, Influence of temperature and plasma parameters on the properties of PEALD HfO2, Opt. Mater. Express 11, 1918–1942 (2021). https://doi.org/10.1364/OME.422156. [Google Scholar]
  32. Beladiya V, Faraz T, Schmitt P, Munser AS, Schröder S, Riese S, Mühlig C, Schachtler D, Steger F, Botha R, Otto F, Fritz T, Helvoirt C, Kessels WMM, Gargouri H, Szeghalmi A, Plasma-enhanced atomic layer deposition of HfO2 with substrate biasing: thin films for high-reflective mirrors, ACS Appl. Mater. Interfaces 14, 14677−14692 (2022). https://doi.org/10.1021/acsami.1c21889. [Google Scholar]
  33. Alam S, Paul P, Beladiya V, Schmitt P, Stenzel O, Trost M, Wilbrandt S, Mühlig C, Schröder S, Matthäus G, et al., Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition, Coatings 13, 278 (2023). https://doi.org/10.3390/coatings13020278. [Google Scholar]
  34. Franta D, Nečas D, Ohlídal I, Universal dispersion model for characterization of optical thin films over a wide spectral range: application to hafnia, Appl. Opt. 54, 9108 (2015). https://doi.org/10.1364/AO.54.009108. [Google Scholar]
  35. Siefke T, Kroker S, Pfeiffer K, Puffky O, Dietrich K, Franta D, et al., Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range, Adv. Opt. Mater. 4, 1780–1786 (2016). https://doi.org/10.1002/adom.201600250. [CrossRef] [Google Scholar]
  36. Puurunen RL, Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water, J. Appl. Phys. 95, 4777–4786 (2004). https://doi.org/10.1063/1.1689732. [Google Scholar]
  37. Triyoso DH, Hegde RI, White BE, Tobin PJ, Physical and electrical characteristics of atomic-layer-deposited hafnium dioxide formed using hafnium tetrachloride and tetrakis (ethylmethylaminohafnium), J. Appl. Phys. 97, 124107 (2005). https://doi.org/10.1063/1.1947389. [Google Scholar]
  38. Pasko SV, Hubert-Pfalzgraf LG, Abrutis A, Richard P, Bartasyte A, Kazlauskiene V, New sterically hindered Hf, Zr and Y β-diketonates as MOCVD precursors for oxide films, J. Mater. Chem. 14, 1245–1251 (2004). https://doi.org/10.1039/B401052C. [Google Scholar]
  39. Zherikova KV, Morozova NB, Zelenina LN, Sysoev SV, Chusova TP, Igumenov IK, Thermal properties of hafnium(IV) and zirconium(IV) β-diketonates, J. Therm. Anal. Calorim. 92, 729–734 (2008). https://doi.org/10.1007/s10973-008-9027-x. [Google Scholar]
  40. Martínez-Puente MA, et al., ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies, Mater. Sci. Eng. B 285, 115964 (2022). https://doi.org/10.1016/J.MSEB.2022.115964. [Google Scholar]
  41. Stenzel O, Wilbrandt S, Friedrich KF, Kaiser N, Realistische Modellierung der NIR/VIS/UV-optischen Konstanten dünner optischer Schichten im Rahmen des Oszillatormodells, VIP 21, 15–23 (2009). https://doi.org/10.1002/vipr.200900396. [Google Scholar]

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