Open Access
Table 1
ALD parameter for Hafnia deposition using TDMAH and oxygen plasma in an OPAL-tool.
| Step | Parameter | Value |
|---|---|---|
| 1 | TDMAH pulse time | 0.4 s |
| 2 | Purge time | 8 s |
| 3 | Pump down time | 2 s |
| 4 | Gas stabilization time | 3 s |
| 5 | Oxygen plasma pulse | |
| Time | 10 s | |
| Flow | 50 sccm | |
| Power | 300 W | |
| 6 | Purge time | 10 s |
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