Issue |
J. Eur. Opt. Society-Rapid Publ.
Volume 20, Number 1, 2024
|
|
---|---|---|
Article Number | 8 | |
Number of page(s) | 13 | |
DOI | https://doi.org/10.1051/jeos/2024005 | |
Published online | 01 April 2024 |
Research Article
Investigating ultra-thin Ag and Au layers using spectrophotometry and AFM imaging
Institut Fresnel, Avenue Escadrille Normandie-Niémen, 13013 Marseille, France
* Corresponding author: riley.shurvinton@gmail.com
Received:
8
November
2023
Accepted:
9
February
2024
A spectrophotometric method is demonstrated for refractive index and thickness determination of thin and ultrathin metallic films. The method involves a three-layer stack where the metallic layer of interest is deposited on an opaque Si wafer coated with SiO2. This stack creates oscillations in the reflectance spectrum, which are highly sensitive to the index of the metallic film, allowing precise determination of the index of layers down to 1 nm. Experimental index values are given for Ag and Au over the wavelength range of 370–835 nm. These results are correlated with Atomic force microscopy (AFM) images of the films, which reveal dramatic changes in structure for layers of different thickness.
Key words: Spectrophotometry / Refractive index determination / Characterisation / Metallic thin films / AFM
© The Author(s), published by EDP Sciences, 2024
This is an Open Access article distributed under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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