Issue |
J. Eur. Opt. Soc.-Rapid Publ.
Volume 10, 2015
|
|
---|---|---|
Article Number | 15002 | |
Number of page(s) | 5 | |
DOI | https://doi.org/10.2971/jeos.2015.15002 | |
Published online | 29 January 2015 |
Regular paper
Fourier ellipsometry – an ellipsometric approach to Fourier scatterometry
1
Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, H-1121 Budapest, Konkoly Thege u. 29-33, Hungary
2
Optics Research Group, Department of Imaging Physics, Faculty of Applied Sciences, Delft University of Technology, P. O. Box 5046, 2600GA Delft, The Netherlands
3
Zuse Institute Berlin (ZIB), Takustrasse 7, D-14195 Berlin, Germany
Received:
17
November
2014
Revised:
19
December
2014
An extension of Fourier scatterometry is presented, aiming at increasing the sensitivity by measuring the phase difference between the reflections polarized parallel and perpendicular to the plane of incidence. The ellipsometric approach requires no additional hardware elements compared with conventional Fourier scatterometry. Furthermore, incoherent illumination is also sufficient, which enables spectroscopy using standard low-cost light sources.
Key words: Optical metrology / ellipsometry / scatterometry / RCWA / Fourier scatterometry / sensitivity
© The Author(s) 2015. All rights reserved.
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