| Issue |
J. Eur. Opt. Soc.-Rapid Publ.
Volume 7, 2012
|
|
|---|---|---|
| Article Number | 12031 | |
| Number of page(s) | 7 | |
| DOI | https://doi.org/10.2971/jeos.2012.12031 | |
| Published online | 25 July 2012 | |
Regular papers
Scanning effects in coherent fourier scatterometry
1
Delft University of Technology, Optics Research Group, Imaging Science and Technology, P.O. Box 5046, 2600 GA Delft, The Netherlands
2
VSL Dutch Metrology Institute, 2600 AR Delft, The Netherlands
Received:
5
June
2012
Revised:
22
June
2012
Incoherent Fourier Scatterometry (IFS) is a successful tool for high accuracy nano-metrology. As this method uses only far field measurements, it is very convenient from the point of view of industrial applications. A recent development is Coherent Fourier Scatterometry (CFS) in which incoherent illumination is replaced by a coherent one. Through sensitivity analyses using rigorous electromagnetic simulations, we show that the use of coherence and multiple scanning makes Coherent Fourier Scatterometry (CFS) more sensitive than Incoherent Fourier Scatterometry (IFS). We also report that in Coherent Fourier Scatterometry it is possible to determine the position of the sample with respect to the optical axis of the system to a precision dependent only on the experimental noise.
Key words: scatterometry / grating / lithography inspection / coherence / nanopositioning
© The Author(s) 2012. All rights reserved.
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