Open Access
| Issue |
J. Eur. Opt. Soc.-Rapid Publ.
Volume 6, 2011
|
|
|---|---|---|
| Article Number | 11010 | |
| Number of page(s) | 8 | |
| DOI | https://doi.org/10.2971/jeos.2011.11010 | |
| Published online | 08 April 2011 | |
- J. Hiltunen, M. Hiltunen, J. Puustinen, J. Lappalainen, and P. Karioja, “Fabrication of optical waveguides by imprinting: usage of positive tone resist as a mould for UV-curable polymer” Opt. Express 17, 22813–22822 (2009). [NASA ADS] [CrossRef] [Google Scholar]
- S. Ricciardi, S. Popov, A. T. Friberg, and S. Sergeyev, “Tunable microcavity solid-state dye laser for biometrics applications” Proc. SPIE 6729, 67292N (2007). [NASA ADS] [CrossRef] [Google Scholar]
- D. Nilsson, S. Balslev, M. M. Gregersen, and A. Kristensen, “Micro-fabricated solid state dye lasers based on a photo/definable polymer” Appl. Opt. 44, 4965–4971 (2005). [NASA ADS] [CrossRef] [Google Scholar]
- D. Tailaert, F. Van laere, M. Ayre, W. Bogaerts, D. Van Thourhout, P. Bienstman, and R. Baets, “Grating couplers for coupling between optical fibers and nanophotonic waveguides” Jpn. J. Appl. Phys. 45, 6071–6077 (2006). [NASA ADS] [CrossRef] [Google Scholar]
- S. Scheerlinck, J. Schrauwen, F. Van Laere, D. Van Thourhout, and R. Baets, “Efficient, broadband and compact metal grating couplers for silicon-on-insulator waveguides” Opt. Express 15, 9625–9630 (2007). [NASA ADS] [CrossRef] [Google Scholar]
- J. S. Yang, C. H. Choi, B. O, S. G. Lee, and E. Lee, “Design and characterization of an out-of-plane polymer waveguide grating coupler” Proc. SPIE 6476, 647611 (2007). [NASA ADS] [CrossRef] [Google Scholar]
- B. Wang, J. H. Jiang, and G. P. Nordin, “Embedded slanted grating for vertical coupling between fibers and silicon-on-insulator planar waveguides” IEEE Photon. Technol. Lett. 17, 1884–1886 (2005). [NASA ADS] [CrossRef] [Google Scholar]
- V. Kudryashov, X. C. Yuan, W. C. Cheong, and K. Radhakrishnan, “Grey scale structures formation in SU-8 with e-beam and UV” Microelectron. Eng. 67-68, 306–311 (2003). [CrossRef] [Google Scholar]
- W. H. Wong, and E. Y. B. Pun, “Exposure characteristics and three-dimensional profiling of SU8C resist using electron beam lithography” J. Vac. Sci. Technol. B 19, 732–735 (2001). [NASA ADS] [CrossRef] [Google Scholar]
- E. A. Shields, F. Williamson, and J. R. Leger, “Electron-beam lithography for thick refractive optical elements in SU-8” J. Vac. Sci. Technol. B 21, 1453–1458 (2003). [NASA ADS] [CrossRef] [Google Scholar]
- K. A. Bates, L. Li, R. L. Roncone, J. Burke, “Gaussian beams from variable groove depth grating couplers in planar waveguides” Appl Opt. 32, 2112–2116 (1993). [NASA ADS] [CrossRef] [Google Scholar]
- H. Jansen, M. D. Boer, R. Wiegerink, N. Tas, E. Smulders, C. Neagu, and M. Elwenspoek, “RIE lag in high aspect ratio trench etching of silicon” Microelectron. Eng. 35, 45–50 (2003). [Google Scholar]
- R. Waldhausl, B. Schnabel, P. Dannberg, E. Kley, A. Brauer, and W. Karthe, “Efficient coupling into polymer waveguides by gratings” Appl. Opt. 36, 9383–9390 (1997). [CrossRef] [Google Scholar]
- S. Balslev, T. Rasmussen, P. Shi, and A. Kristensen, “Single mode solid state distributed feedback dye laser fabricated by gray scale electron beam lithography on a dye doped SU-8 resist”, J. Micromech. Microeng. 15, 2456–2460 (2005). [Google Scholar]
- P. Rai-choudhury, Handbook of microlithography, micromachining and microfabrication, volume 1: microlithography (SPIE and The Institution of Electrical Engineers, Stevenage, 1997). [Google Scholar]
- A. del Campo, and C. Greiner, “SU-8: a photoresist for high-aspect ratio and 3D submicron lithography” J. Micromech. Microeng. 17, R81–R95 (2007). [Google Scholar]
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.