Figure 1
Download original image
Left: Scheme of the SBIL lithography head. The binary beam splitter gratings G1 and G2 generate two collimated and coherent beams. The green marked area can rotate around the z-axis by angle γ. The mechanical setup above the microscope objective lens MO can be laterally shifted in the x–y-plane. Right: Principal scan-and-stitch process of scanning beam interference lithography.
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.