Open Access
| Issue |
J. Eur. Opt. Society-Rapid Publ.
Volume 22, Number 1, 2026
|
|
|---|---|---|
| Article Number | 36 | |
| Number of page(s) | 13 | |
| DOI | https://doi.org/10.1051/jeos/2026028 | |
| Published online | 12 May 2026 | |
- Chen Y., Konkola P., Heilmann R.K., Schattenburg M.L. (2002) Nanometer-accurate grating fabrication with scanning beam interference lithography, Proc. SPIE 4936, 126–134. https://doi.org/10.1117/12.469431. [Google Scholar]
- Chen Y., Konkola P., Heilmann R.K., Joo C., Schattenburg M.L. (2002) Beam alignment for scanning beam interference lithography, J. Vac. Sci. Technol. B 20, 3071–3074. https://doi.org/10.1116/1.1523402. [Google Scholar]
- Zhou Q., Oh J., Kim D., Suryani I.O., Han R., Kang S. (2026) Control of scanning beam interference lithography by real-time compensation of scan angle error through acoustooptic modulation and phase-shift grating interferometry for large area nanostructuring, Micro Nano Manuf. 2. https://doi.org/10.1007/s44374-025-00009-2. [Google Scholar]
- Feigel A., Kotler Z., Sfez B. (2002) Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals, Opt. Lett. 27, 746–748. https://doi.org/10.1364/OL.27.000746. [Google Scholar]
- van Soest G., van Wolferen H.A.G.M., Hoekstra H.J.W.M., Worhoff K., Lambeck P.V. (2005) Laser interference lithography with highly accurate interferometric alignment, Jpn. J. Appl. Phys. 44, 6568–6570. https://doi.org/10.1143/JJAP.44.6568. [Google Scholar]
- Gao Q., Li Y., Zhong L., Li Y. (2025) Global alignment reference strategy for laser interference lithography pattern arrays, Microsyst. Nanoeng. 11, 4. https://doi.org/10.1038/s41378-025-00889-4. [Google Scholar]
- Jäger G., Manske E., Hausotte T., Müller A., Balzer F. (2016) Nanopositioning and nanomeasuring machine NPMM-200 – a new powerful tool for large-range micro- and nanotechnology, Surf. Topogr. Metrol. Prop. 4, 034004. https://doi.org/10.1088/2051-672X/4/3/034004. [Google Scholar]
- Li Y., Jiang S., Chen X., Liu Z.,Wang W., Song Y., Bayanheshig. (2023) Accurate measurement and adjustment method for interference fringe direction in a scanning beam interference lithography system, Opt. Express. https://doi.org/10.1364/OE.485488. [Google Scholar]
- Li W., et al. (2025) Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating, Light Sci. Appl. https://doi.org/10.1038/s41377-025-01785-2. [Google Scholar]
- Schober C., Pruss C., Herkommer A., Osten W. (2020) The NPMM-200: large area high resolution for freeform surface measurement, Proc. SPIE. https://doi.org/10.1117/12.2564918. [Google Scholar]
- Takeda M., Ina H., Kobayashi S. (1982) Fourier-transform method of fringe-pattern analysis for computer-based topography and interferometry, J. Opt. Soc. 72. https://doi.org/10.1364/JOSA.72.000156. [Google Scholar]
- Brown B.R., Lohmann A.W. (1966) Complex spatial filtering with binary masks, Appl. Opt. 5, 967–969. https://doi.org/10.1364/AO.5.000967. [Google Scholar]
- Gronle M., Lyda W., Wilke M., Kohler C., Osten W. (2014) itom: an open source metrology, automation, and data evaluation software, Appl. Opt. 53, 2974–2982. https://doi.org/10.1364/AO.53.002974. [Google Scholar]
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