| Issue |
J. Eur. Opt. Soc.-Rapid Publ.
Volume 9, 2014
|
|
|---|---|---|
| Article Number | 14026 | |
| Number of page(s) | 4 | |
| DOI | https://doi.org/10.2971/jeos.2014.14026 | |
| Published online | 21 July 2014 | |
Regular papers
The impact of O/Si ratio and hydrogen content on ArF excimer laser ablation of fused silica
1
University of Applied Sciences and Arts, Laboratory of Laser and Plasma Technologies, Von-Ossietzky-Straße 99, 37085 Göttingen, Germany
2
Laser-Laboratory Göttingen e.V., Hans-Adolf-Krebs-Weg 1, 37077 Göttingen, Germany
3
Fraunhofer Institute for Surface Engineering and Thin Films, Application Center for Plasma and Photonic, Von-Ossietzky-Straße 100, 37085 Göttingen, Germany
Received:
15
April
2014
Revised:
23
June
2014
The impact of stoichiometry and hydrogen content on the ArF excimer laser ablation characteristics of fused silica is investigated. Near-surface substoichiometic SiOx with X < 2 diminishes the ablation threshold as a result of increased absorption. The ablation rate is raised by an elevated hydrogen content. As confirmed by mass spectrometric analysis, the laser-induced formation of substoichiometric near-surface layers within the ablation spot sustains absorption and ablation for consecutive laser pulses.
Key words: Fused silica / silicon suboxide / laser ablation / ablation threshold / stoichiometry
© The Author(s) 2014. All rights reserved.
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