| Issue |
J. Eur. Opt. Soc.-Rapid Publ.
Volume 2, 2007
|
|
|---|---|---|
| Article Number | 07029 | |
| Number of page(s) | 4 | |
| DOI | https://doi.org/10.2971/jeos.2007.07029 | |
| Published online | 13 November 2007 | |
Regular papers
Third order Bragg grating filters in small SOI waveguides
1
Intel Technology Sdn. Bhd., Assembly Technology Development Malaysia (ATD-M), but carried out this work whilst at the University of Surrey
2
Politecnico di Bari, Dipartimento di Elettrotecnica ed Elettronica, via Edoardo Orabona n. 4, 70125 Bari, Italy
3
The Advanced Technology Institute, University of Surrey, Guildford, Surrey, UK, GU2 7XH
4
Innos Ltd., Southampton, UK, SO17 1BJ
Received:
11
October
2007
Third order grating filters fabricated in small Silicon-on-Insulator rib waveguides are demonstrated. Variations in grating etch depth and duty cycle are considered, and a maximum experimental reflection of 42% is demonstrated for gratings of 1500 µm in length, with a grating period of approximately 689 nm and an etch depth of 200 nm. Agreement with modeling is shown to be good.
Key words: Fabrication / filters / integrated optics / optical waveguides / rib waveguides / third order gratings
© The Author(s) 2007. All rights reserved.
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