Issue |
J. Eur. Opt. Soc.-Rapid Publ.
Volume 5, 2010
|
|
---|---|---|
Article Number | 10021 | |
Number of page(s) | 7 | |
DOI | https://doi.org/10.2971/jeos.2010.10021 | |
Published online | 27 April 2010 |
Regular papers
Application of the method of auxiliary sources to a defect-detection inverse problem of optical diffraction microscopy
1
Department of Process and Chemical Engineering, University of Bremen, Badgasteiner Str. 3, 28359 Bremen, Germany
2
DTU Mathematics, Technical University of Denmark, Matematiktorvet 303S, DK-2800 Kgs. Lyngby, Denmark
3
Danish Fundamental Metrology, Technical University of Denmark, Matematiktorvet 307, DK-2800 Kgs. Lyngby, Denmark
4
DTU Fotonik, Technical University of Denmark, Ørsteds Plads 345V, DK-2800 Kgs. Lyngby, Denmark
a mirza@iwt.uni-bremen.de
b m.p.soerensen@mat.dtu.dk
c peh@dfm.dtu.dk
d alav@fotonik.dtu.dk
Received:
8
March
2010
We propose a method of numerical solution of a type of inverse scattering problem that arises in the optical characterisation/quality control of nanostructures. The underlying global, ill-posed, nonlinear optimisation problem is first localised by best-fit matching of library and measured diffraction efficiency patterns. The inverse problem is then solved using piecewise linear interpolation between the best far-field matches. Finally, the results are refined, on average, by solving an additional local optimisation problem formulated in terms of the method of auxiliary sources. To illustrate the proposed method, we apply it in a concrete quantitative characterisation of a non-periodic, nano-scale grating defect, with numerically simulated measurements. It is shown that the presented procedure can solve the inverse problem with an accuracy usually thought to require rigorous electromagnetic theories.
Key words: method of auxiliary sources / inverse scattering / optical diffraction microscopy / nanogratings
© The Author(s) 2010. All rights reserved.
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