Articles citing this article

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Cited article:

Wafer-based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratings

Sven van Haver, Wim M. J. Coene, Koen D’havé, et al.
Applied Optics 53 (12) 2562 (2014)
https://doi.org/10.1364/AO.53.002562

Digital in-line holography in a droplet with cavitation air bubbles

S. Coëtmellec, D. Pejchang, D. Allano, G. Gréhan, D. Lebrun, M. Brunel and A. J. E. M. Janssen
Journal of the European Optical Society-Rapid Publications 9 14056 (2014)
https://doi.org/10.2971/jeos.2014.14056

Digital in-line holography assessment for general phase and opaque particle

S. Coëtmellec, W. Wichitwong, G. Gréhan, D. Lebrun, M. Brunel and A. J. E. M. Janssen
Journal of the European Optical Society-Rapid Publications 9 14021 (2014)
https://doi.org/10.2971/jeos.2014.14021