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Cited article:

Crystallization behavior of ion beam sputtered HfO₂ thin films and its effect on the laser-induced damage threshold

Zoltán Balogh-Michels, Igor Stevanovic, Aurelio Borzi, Andreas Bächli, Daniel Schachtler, Thomas Gischkat, Antonia Neels, Alexander Stuck, Roelene Botha

J. Eur. Opt. Soc.-Rapid Publ., 17 1 (2021) 3

Published online: 2021-03-06

DOI: https://doi.org/10.1186/s41476-021-00147-w

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