Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold
J. Eur. Opt. Soc.-Rapid Publ., 17 1 (2021) 3
Published online: 2021-03-06
Articles citing this article
The Citing articles tool gives a list of articles citing the current article.
The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program. You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).
Cited article:
This article has been cited by the following article(s):
Non-oxygen micro-defects and laser damage resistance of HfO2 films deposited by ion beam sputtering
Gang Hu, Mingdong Kong, Ming Wei, Weidong Gao, Bo Wang, Ming Li and Wenjun HeJournal of Alloys and Compounds 1050 185504 (2026)
https://doi.org/10.1016/j.jallcom.2025.185504
Mechanical stress, optical and surface properties of high temperature annealed HfO2, Sc2O3 and Al2O3 binary mixture thin films deposited by ion beam sputtering
Giedrius AbromavičiusLithuanian Journal of Physics 65 (3) 11 (2025)
https://doi.org/10.3952/physics.2025.65.3.5
Effect of oxygen flow on micro-defects and laser damage resistance of ion-beam sputtered hafnium dioxide films
Gang Hu, Mingdong Kong, Ming Wei, Weidong Gao, Bo Wang, Ming Li and Wenjun HeVacuum 239 114443 (2025)
https://doi.org/10.1016/j.vacuum.2025.114443
(2025)
https://doi.org/10.21203/rs.3.rs-7699479/v2
Impact of high-temperature annealing on hafnia-silica composite coatings deposited via ion beam sputtering for high-peak power 1064 nm lasers
C. Harthcock, H. T. Nguyen, D. Vipin and M. HuangOptical Materials Express 15 (10) 2592 (2025)
https://doi.org/10.1364/OME.572003
(2025)
https://doi.org/10.21203/rs.3.rs-7699479/v1
Texture Transfer in Dielectric Layers via Nanocrystalline Networks: Insights from in Situ 4D-STEM
Robert Winkler, Alexander Zintler, Oscar Recalde-Benitez, Tianshu Jiang, Déspina Nasiou, Esmaeil Adabifiroozjaei, Philipp Schreyer, Taewook Kim, Eszter Piros, Nico Kaiser, Tobias Vogel, Stefan Petzold, Lambert Alff and Leopoldo Molina-LunaNano Letters 24 (10) 2998 (2024)
https://doi.org/10.1021/acs.nanolett.3c03941
Mechanism of Surface Hydroxylation Acceleration and Laser-Induced Damage Threshold Reduction during Ion Beam Sputtering of Fused Silica
Mingjin Xu, Weibin Wu, Yongsheng Ke, Xiaohong Liu, Yaoyu Zhong and Xiaopeng GaoApplied Sciences 14 (11) 4550 (2024)
https://doi.org/10.3390/app14114550
Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrors
Vivek Beladiya, Tahsin Faraz, Paul Schmitt, et al.ACS Applied Materials & Interfaces 14 (12) 14677 (2022)
https://doi.org/10.1021/acsami.1c21889
The Influence of Ion Beam Bombardment on the Properties of High Laser-Induced Damage Threshold HfO2 Thin Films
Yingxue Xi, Jiwu Zhao, Jin Zhang, Changming Zhang and Qi WuCrystals 12 (1) 117 (2022)
https://doi.org/10.3390/cryst12010117
Fabrication and characterization of sol–gel-based coatings on quartz glass to obtain antireflective effect at 1054 nm for optics of high power Nd:phosphate glass laser
Susmita Podder, Aparajita Mallick Nath, C Mukherjee, V V V Subrahmanyam and Sunirmal JanaBulletin of Materials Science 45 (3) (2022)
https://doi.org/10.1007/s12034-022-02732-2
Cerium oxide capping on Y-doped HfO2 films for ferroelectric phase stabilization with endurance improvement
Kazuto Mizutani, Takuya Hoshii, Hitoshi Wakabayashi, Kazuo Tsutsui, Edward Y. Chang and Kuniyuki KakushimaJapanese Journal of Applied Physics 61 (2) 021006 (2022)
https://doi.org/10.35848/1347-4065/ac468b
Multilayer redox-based HfOx/Al2O3/TiO2 memristive structures for neuromorphic computing
Seongae Park, Benjamin Spetzler, Tzvetan Ivanov and Martin ZieglerScientific Reports 12 (1) (2022)
https://doi.org/10.1038/s41598-022-22907-5